JPH0516657B2 - - Google Patents
Info
- Publication number
- JPH0516657B2 JPH0516657B2 JP21716686A JP21716686A JPH0516657B2 JP H0516657 B2 JPH0516657 B2 JP H0516657B2 JP 21716686 A JP21716686 A JP 21716686A JP 21716686 A JP21716686 A JP 21716686A JP H0516657 B2 JPH0516657 B2 JP H0516657B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- processed
- transparency
- magnetic field
- bell gear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005684 electric field Effects 0.000 claims description 6
- 238000005530 etching Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21716686A JPS6373624A (ja) | 1986-09-17 | 1986-09-17 | 有磁場マイクロ波プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21716686A JPS6373624A (ja) | 1986-09-17 | 1986-09-17 | 有磁場マイクロ波プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6373624A JPS6373624A (ja) | 1988-04-04 |
| JPH0516657B2 true JPH0516657B2 (en]) | 1993-03-05 |
Family
ID=16699892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21716686A Granted JPS6373624A (ja) | 1986-09-17 | 1986-09-17 | 有磁場マイクロ波プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6373624A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH089787B2 (ja) * | 1987-07-24 | 1996-01-31 | 日本電信電話株式会社 | プラズマエツチング装置 |
| US4970435A (en) * | 1987-12-09 | 1990-11-13 | Tel Sagami Limited | Plasma processing apparatus |
-
1986
- 1986-09-17 JP JP21716686A patent/JPS6373624A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6373624A (ja) | 1988-04-04 |
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